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Dry Pump Helium Leak Detector for Wafer Leak Detection SFJ-231D

Dry Pump Helium Leak Detector for Wafer Leak Detection SFJ-231D

Ultra Sensitive Helium Leak Detector

Sniffer Mode Helium Leak Detector

Graphs Display Helium Leak Detector

Place of Origin:

Anhui, China

Brand Name:

Wayeal

Certification:

CE

Model Number:

SFJ-231D

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Product Details
Communication Interface:
RS232/485, LAN
Leak Rate Display:
Numbers, Bar Charts, Graphs
User Interface:
7inch Color Touch Screen
Product Name:
Helium Leak Detector
Mini Leak Detection Rate(Pa.m3/s)/Vaccum Mode:
5*10-13 Pa.m3/s
Response Time(s):
<1s
MES Interface:
Standard
Mini Leak Detection Rate(Pa.m3/s)/Sniffer Mode:
2.5*10-9 Pa.m3/s
Highlight:

Ultra Sensitive Helium Leak Detector

,

Sniffer Mode Helium Leak Detector

,

Graphs Display Helium Leak Detector

Payment & Shipping Terms
Minimum Order Quantity
1 Unit
Price
Negotiate
Packaging Details
Wooden Case
Delivery Time
35 days
Payment Terms
T/T, VISA
Supply Ability
200 Units/Month
Product Description

Dry Pump Helium Leak Detector for Wafer Leak Detection SFJ-231D

Technical Parameters of Helium Leak Detector SFJ-231D

Product name Helium leak detector SFJ-231D
Minimum detectable leak rate(Pa·m³/s)/ vacuum mode 5.0*10-13 Pa·m3/s
Minimum detectable leak rate(Pa·m³/s)/ sniffer mode 5.0*10-9 Pa·m3/s
Maximum allowable leak detection pressure (Pa) 1500
Response time <1s
Startup time ≤2min
Detectable quality 2, 3,4(H2 ,He3, He4)
Man-machine interface 7" color LCD touch screen
Ion source 2pcs, iridium coated yttrium oxide, automatic switching
I/O Input/output interface 8 inputs and 8 outputs
Communication interface RS232/485, USB*2
MES interface standard
Leak Detection port DN25KF
Power Supply AC220V, 50Hz/60Hz
Operating temperature 0~40°C
Language English
Leakage rate display Figure, bar chart, curve chart
Diamension 645*678*965mm

Application of SFJ-231D Helium Leak Detector for the Wafer

In helium mass spectrometry leak detection technology, the application of dry pumps (oil-free dry vacuum pumps) mainly depends on the working conditions of the equipment to be inspected, the cleanliness requirements and the technical requirements of helium mass spectrometry leak detectors (e.g. Wayeal SFJ-231D).

Detection Method: Vacuum Spray Helium Method (High-Sensitivity Mode)

1: System Evacuation and Baseline Calibration

Evacuate to base pressure: Etching chamber: ≤0.1Pa (dry pump + molecular pump combination);  CVD/PVD chamber: ≤10⁻³ Pa (higher requirements for coating equipment).

Leak detector calibration: Use a standard leak reference (e.g., 1×10⁻⁷ Pa·m³/s) to calibrate the SFJ-231D and verify instrument response linearity.

Step 2: Helium Spray Detection

Detection area: O-ring grooves, bolt holes, VCR/VCO metal seals, weld joints, Ceramic insulators, copper gaskets, Bellows connections.

Helium spray operation:

Use a handheld helium spray gun (with 0.1 mm fine-tuning nozzle) at 3-5mm distance from the detection point. Move at 5cm/s speed, dwelling 2-3 seconds per point (SFJ-231D response time <1 sec). Adjust helium pressure to 0.2-0.3MPa to avoid airflow disturbance.

Step 3: Leak Point Determination and Recording

Leak rate: Semiconductor equipment allowable leak rate: Typically ≤1×10⁻⁹ Pa·m³/s (per SEMI standards).

Data recording: When the SFJ-231D displays a leak rate peak, mark the leak point with a highlighter pen.

Save leak rate curves and location data (export via USB).

Step 4: Re-inspection and Verification

Perform a second helium spray on identified leaks to confirm repeatability.

After repairing major leaks, re-evacuate to base pressure and conduct a full re-inspection.

 

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